Quality Surface Analysis for Polarized Grid Plasma Nitridings

Authors

  • Mihai AXINTE "Gheorghe Asachi" Technical University of Iasi, Romania
  • Manuela-Cristina PERJU "Gheorghe Asachi" Technical University of Iasi, Romania
  • Carmen NEJNERU "Gheorghe Asachi" Technical University of Iasi, Romania
  • Ion HOPULELE "Gheorghe Asachi" Technical University of Iasi, Romania
  • Iulian CIMPOEŞU "Gheorghe Asachi" Technical University of Iasi, Romania

Keywords:

plasma nitriding, cathodic active screen grid, hollow cathode effect, scanning electron microscopy

Abstract

For the study regarding the effect of the polarized grid a prototype plasma nitriding facility was used. A polarized grid was placed inside the working chamber, into the space between the anode and cathode, a negative polarised grid.
The sample used for the tests has a special configuration, provided with three different diameter holes, to highlight the hollow cathode effect on the holes near by sample areas.
The chemical analysis for the deposited surface layer was made.

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Published

2013-03-15

Issue

Vol. 36 No. 1 (2013)

Section

Articles

How to Cite

1.
Quality Surface Analysis for Polarized Grid Plasma Nitridings. Ann_UGAL_MMS [Internet]. 2013 Mar. 15 [cited 2026 Nov. 3];36(1):51-6. Available from: https://ojs.ugal.ro/index.php/mms/article/view/2852

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