Deposition Technologies for Obtaining Thin Films with Special Properties

Auteur/ices

  • Cătălin-Andrei ȚUGUI “Gheorghe Asachi” Technical University of Iasi
  • Petrică VIZUREANU “Gheorghe Asachi” Technical University of Iasi
  • Carmen NEJNERU “Gheorghe Asachi” Technical University of Iasi
  • Manuela-Cristina PERJU “Gheorghe Asachi” Technical University of Iasi
  • Mihai AXINTE “Gheorghe Asachi” Technical University of Iasi
  • Simona-Mădălina BĂLŢATU “Gheorghe Asachi” Technical University of Iasi

Mots-clés :

deposition method, thin layers, substrate, SEM

Résumé

The properties of metallic materials can be improved by deposition of materials. The coating has a tear strength and better hydro-abrasive corrosion. The thin layer deposition has a thickness of less than 10 micrometers.
When speaking about deposition technologies, it is not just about deposited thin layers, but the whole assembly (layer / substrate), therefore the degree of adherence and the costs of making such a substrate have to be taken into account and the whole must be much more powerful than anything taken separately.
In this paper we presented several methods of thin film deposition. We also highlighted some of the advantages and disadvantages of several deposition methods.

Creative Commons License

Téléchargements

Les données relatives au téléchargement ne sont pas encore disponibles.

Téléchargements

Publiée

2015-09-15

Numéro

Rubrique

Articles

Comment citer

1.
Deposition Technologies for Obtaining Thin Films with Special Properties. Ann_UGAL_MMS [Internet]. 15 sept. 2015 [cité 2 nov. 2026];38(3):58-62. Disponible sur: https://ojs.ugal.ro/index.php/mms/article/view/1306

Articles les plus lus par le ou les mêmes auteur/ices

1 2 > >>