Deposition Technologies for Obtaining Thin Films with Special Properties

Authors

  • Cătălin-Andrei ȚUGUI “Gheorghe Asachi” Technical University of Iasi
  • Petrică VIZUREANU “Gheorghe Asachi” Technical University of Iasi
  • Carmen NEJNERU “Gheorghe Asachi” Technical University of Iasi
  • Manuela-Cristina PERJU “Gheorghe Asachi” Technical University of Iasi
  • Mihai AXINTE “Gheorghe Asachi” Technical University of Iasi
  • Simona-Mădălina BĂLŢATU “Gheorghe Asachi” Technical University of Iasi

Keywords:

deposition method, thin layers, substrate, SEM

Abstract

The properties of metallic materials can be improved by deposition of materials. The coating has a tear strength and better hydro-abrasive corrosion. The thin layer deposition has a thickness of less than 10 micrometers.
When speaking about deposition technologies, it is not just about deposited thin layers, but the whole assembly (layer / substrate), therefore the degree of adherence and the costs of making such a substrate have to be taken into account and the whole must be much more powerful than anything taken separately.
In this paper we presented several methods of thin film deposition. We also highlighted some of the advantages and disadvantages of several deposition methods.

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Published

2015-09-15

Issue

Vol. 38 No. 3 (2015)

Section

Articles

How to Cite

1.
Deposition Technologies for Obtaining Thin Films with Special Properties. Ann_UGAL_MMS [Internet]. 2015 Sep. 15 [cited 2026 Nov. 2];38(3):58-62. Available from: https://ojs.ugal.ro/index.php/mms/article/view/1306

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