Deposition Technologies for Obtaining Thin Films with Special Properties

Cătălin-Andrei ȚUGUI; Petrică VIZUREANU; Carmen NEJNERU; Manuela-Cristina PERJU; Mihai AXINTE; Simona-Mădălina BĂLŢATU

Autor/innen

Cătălin-Andrei ȚUGUI “Gheorghe Asachi” Technical University of Iasi
Petrică VIZUREANU “Gheorghe Asachi” Technical University of Iasi
Carmen NEJNERU “Gheorghe Asachi” Technical University of Iasi
Manuela-Cristina PERJU “Gheorghe Asachi” Technical University of Iasi
Mihai AXINTE “Gheorghe Asachi” Technical University of Iasi
Simona-Mădălina BĂLŢATU “Gheorghe Asachi” Technical University of Iasi

Schlagwörter:

deposition method, thin layers, substrate, SEM

Abstract

The properties of metallic materials can be improved by deposition of materials. The coating has a tear strength and better hydro-abrasive corrosion. The thin layer deposition has a thickness of less than 10 micrometers.
When speaking about deposition technologies, it is not just about deposited thin layers, but the whole assembly (layer / substrate), therefore the degree of adherence and the costs of making such a substrate have to be taken into account and the whole must be much more powerful than anything taken separately.
In this paper we presented several methods of thin film deposition. We also highlighted some of the advantages and disadvantages of several deposition methods.