Structural analysis of alumina thin layer prepared by controlled oxidation process

Auteur/ices

  • Constantin Gheorghieș Faculty of Sciences, Department of Physics, “Dunarea de Jos“ University of Galati
  • Livia Gheorghieș Faculty of Metallurgy and Materials Sciences, “Dunarea de Jos” University of Galati
  • S Ciortan Faculty of Mechanics, “Dunarea de Jos“ University of Galati
  • Viorel Păunoiu Faculty of Mechanics, “Dunarea de Jos“ University of Galati
  • Alina Cantaragiu Faculty of Mechanics, “Dunarea de Jos“ University of Galati
  • C. Lalău Faculty of Mechanics, “Dunarea de Jos“ University of Galati
  • D. E. Rusu Faculty of Mechanics, “Dunarea de Jos“ University of Galati

Mots-clés :

aluminium, alumina, oxidation, structure, roughness, XRD, SEM

Résumé

Alumina thin layers were prepared by controlled oxidation process of aluminium obtained by PVD technique. As support steel sampled have been used. The structural analyses and stress state were performed by SEM and XRD techniques. The roughness of surface was pointed out by using an instrument that allows obtaining of 3D surface profile. The structural data allow conducting by a typical soft of the PVD technique such as to obtain alumina thin layer having certain physical and optical properties.

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Publiée

2009-11-08

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Comment citer

1.
Structural analysis of alumina thin layer prepared by controlled oxidation process. Ann_UGAL_TMB [Internet]. 8 nov. 2009 [cité 2 nov. 2026];27:319-22. Disponible sur: https://ojs.ugal.ro/index.php/tmb/article/view/2029

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