[1]
« Studies and Research on the Production of TiO2 and TiN Thin Films by Assisted Physical Vapor Deposition Magnetron Process », Ann_UGAL_MMS, vol. 40, nᵒ 1, p. 23–30, mars 2017, Consulté le: nov. 02, 2026. Disponible sur: https://ojs.ugal.ro/index.php/mms/article/view/1210