„Surface Roughness and Topography of Ni / Micro-SiC Layers: Influence of Current Density on Electrodeposition Process“, Ann_UGAL_MMS, Bd. 38, Nr. 4, S. 5–10, Dez. 2015, Zugegriffen: Nov. 02, 2026. Verfügbar unter: https://ojs.ugal.ro/index.php/mms/article/view/1284