Quality Surface Analysis for Polarized Grid Plasma Nitridings

Mihai AXINTE; Manuela-Cristina PERJU; Carmen NEJNERU; Ion HOPULELE; Iulian CIMPOEŞU

Autor/innen

Mihai AXINTE "Gheorghe Asachi" Technical University of Iasi, Romania
Manuela-Cristina PERJU "Gheorghe Asachi" Technical University of Iasi, Romania
Carmen NEJNERU "Gheorghe Asachi" Technical University of Iasi, Romania
Ion HOPULELE "Gheorghe Asachi" Technical University of Iasi, Romania
Iulian CIMPOEŞU "Gheorghe Asachi" Technical University of Iasi, Romania

Schlagwörter:

plasma nitriding, cathodic active screen grid, hollow cathode effect, scanning electron microscopy

Abstract

For the study regarding the effect of the polarized grid a prototype plasma nitriding facility was used. A polarized grid was placed inside the working chamber, into the space between the anode and cathode, a negative polarised grid.
The sample used for the tests has a special configuration, provided with three different diameter holes, to highlight the hollow cathode effect on the holes near by sample areas.
The chemical analysis for the deposited surface layer was made.