Surface Roughness and Topography of Ni / Micro-SiC Layers: Influence of Current Density on Electrodeposition Process

Autor/innen

  • Alina CIUBOTARIU "Dunarea de Jos" University of Galati image/svg+xml
  • Lidia BENEA "Dunarea de Jos" University of Galati image/svg+xml
  • Wolfgang SAND University of Duisburg Essen

Schlagwörter:

electrodeposition, composite layers, atomic force microscopy, topography, roughness

Abstract

The surface properties are directly responsible for the performance of engineering materials because most of failures such as friction, wear, corrosion and fatigue often take place on the material surface. Electrodeposition technique is of great interest for industrial usage because it produces functional and protective coatings with low cost and easy control. The present work has the purpose to evaluate roughness and to analyze surfaces of Ni / micro-SiC composite layers obtained at different parameters for electrodeposition. The layers were electroplated from a Watts bath with a suspension of SiC particles (mean diameter size of particles 30 μm) by adding 5 g/L of particles. Electrodeposition took place at 40 oC and a current density of 2 A/dm2 and 4 A/dm2 for 1h. The suspension bath was stirred by a mechanical stirrer at a constant rotational speed of about 500 rpm. The roughness and topography of the layers were evaluated by atomic force microscopy (AFM) method.

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2015-12-15

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Zitationsvorschlag

1.
Surface Roughness and Topography of Ni / Micro-SiC Layers: Influence of Current Density on Electrodeposition Process. Ann_UGAL_MMS [Internet]. 15. Dezember 2015 [zitiert 2. November 2026];38(4):5-10. Verfügbar unter: https://ojs.ugal.ro/index.php/mms/article/view/1284

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